Functions ・ Features

Overall configuration
■ Independent 2-line method
- This method realizes productivity for 2 systems by efficiently using the exposure head of 1 unit.

Transport section
■ Tension control
- Tension optimization during exposure time by a tensioner

■ Substrate feeding mechanism
- Less damage to substrates by the proprietary feeding mechanism

Exposure section

■ Exposure head
- DMD method
- Adopts 4 wavelength types (365nm, 380nm, 395nm, 405nm) LED light sources

■ Movable stage
- Uses granite (stone) for major parts
- Arranges alignment camera and exposure head on the same movable axis
→ Extremely high alignment accuracy and exposure stability

■ Maintenance and plane correction of base material
■ Automatic calibration function